Hi
If you could afford to have SiO2 underneath the SiNx, you could dry
etch to the SiO2 layer and remove the remaining SiO2 by BOE.
Best
Leo


On Tue, Oct 28, 2008 at 2:12 PM, Deepasree Konduparthi
 wrote:
> Hello All:
>
> I was wondering if there is a dry LPCVD nitride etch which does not
> etch silicon and can take photo resist as an etch mask. I need photo
> resist to be there for the next step. We generally do this by chemical
> etching in phosphoric acid by using a hard mask and the dry etch we
> have has no selectivity to silicon. Your help is appreicated
>
> Thanks,
>
> Deepa

--
Xiaoguang "Leo" Liu
Birck Nanotechnology Center,
Purdue University,
1205 W.State Street, West Lafayette, IN, 47906 USA
[email protected]