Yes! I'm talking about the glass wafer. Yes it is absolutely correct that HF
is extremely difficult to deal with glass substrates. Besides, the etching
of Nickel is extremely slow in HF as I have mentioned. So I am trying to
search out an ambient etchant for etching out out both Ni and Ti.

Your comment is highly appreciated.

Anirban

On Fri, Nov 21, 2008 at 6:18 AM, 汪飞  wrote:

> Hi,
>
> Are you talking about a glass wafer?  So, why do you want to use HF?
>

---ANIRBAN
Electrical Engineering
Louisiana State University
Baton Rouge
70802,USA