Anirban,

You can try H2O2 at 40C for wet etching of Ti with other metal mask
(generally Al). We use H2O2 to for the wet etching of TiW.

Samadhan Bhaulal Patil
INESC Microsistemas e Nanotecnologias,
Rua-Alves Redol, 9,
1000-029, Lisbon, Portugal
url: www.inesc-mn.pt

----- Original Message -----
From: "Jie Zou" 
To: "General MEMS discussion" 
Sent: Saturday, November 22, 2008 11:13 PM
Subject: Re: [mems-talk] Ti and Ni wet etching in HF

> Try some Ni etchants. I have one (Ni etchant TFB.
> http://microfabrication.colorado.edu/equipment/pdf%20files/ni_etchant.pdf)
> in my lab. It will not attack the glass, but I'm not sure how it performs
> for Ti.
>
> HF would definitely kill your glass substrate.