Hi ,
Yes I second the motion H2O2 works great.
For Ni we use a diluted Nitric acid.
www.elume.com

----- Original Message -----
From: "Samadhan B. Patil" 
To: "General MEMS discussion" 
Sent: Monday, November 24, 2008 1:28 AM
Subject: Re: [mems-talk] Ti and Ni wet etching in HF

> Anirban,
>
> You can try H2O2 at 40C for wet etching of Ti with other metal mask
> (generally Al). We use H2O2 to for the wet etching of TiW.
>
> Samadhan Bhaulal Patil