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MEMSnet Home: MEMS-Talk: Ti and Ni wet etching in HF
Ti and Ni wet etching in HF
2008-11-17
ANIRBAN SARKAR
2008-11-21
汪飞
2008-11-21
ANIRBAN SARKAR
2008-11-22
Jie Zou
2008-11-23
ANIRBAN SARKAR
anisotropic Ni etching
2008-11-23
Maria Matschuk
2008-11-24
Kvel Bergtatt
2008-12-03
Lou Chomas
2008-11-28
汪飞
2008-11-28
汪飞
2008-11-24
Samadhan B. Patil
2008-11-24
walter
2008-11-27
saravan kallempudi
Ti and Ni wet etching in HF
walter
2008-11-24
Hi ,
Yes I second the motion H2O2 works great.
For Ni we use a diluted Nitric acid.
www.elume.com

----- Original Message -----
From: "Samadhan B. Patil" 
To: "General MEMS discussion" 
Sent: Monday, November 24, 2008 1:28 AM
Subject: Re: [mems-talk] Ti and Ni wet etching in HF

> Anirban,
>
> You can try H2O2 at 40C for wet etching of Ti with other metal mask
> (generally Al). We use H2O2 to for the wet etching of TiW.
>
> Samadhan Bhaulal Patil
reply
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