Now, I'm no expert on EBL, but as far as I can see, the two first steps
should be reversed. If you want a gold pattern on the substrate, you
need to sputter gold on first, then spin coat the resist. Otherwise the
gold etchant will simply etch away all the gold (is 6 seconds enough?).

// Morten

li shifeng wrote:
> Hi, guy
>
> I'm trying to write some patterns on glass substrate. Here is my process:
>
> Spin coat 500nm PMMA 950 C4,
> Sputtering 5nm gold
> EBL exposure
> Strip gold using TFA gold etcant for 6 second
> Develop in MIBK : IPA= 1:3 for 30 sec
>
> The problem is I cannot find any pattern on the substrate afterwards. What are
the possible reasons for that?  Anyone have similar experiences on this or has a
working recipe to share?