Hi, All

I posted a message about EBL on the glass substrate couple days ago. I got
several valuable replys. In order to get more help, I would like to talk a bit
of detail about my case.

I try to write patterns on the glass substrate. In order to get rid of surface
charge problem, I sputtered 5nm gold on the top of PMMA. I used 30KV ebeam to
expose the patterns. Meanwhile, I used multiple dosage to find the optimal
exposure parameters. The dose factors I used are 1, 1.5, 2.0, 2.5, 3.0. After
exposure, I have to strip gold layer to develop PMMA.  I put some large features
in the design so that I can easly identify the position of the patterns. But,
after development, I cannot find any patterns on the glass substrate. I may
believe this maybe due to underexposure because the layer of gold may absorb
some electrons during exposure.

I am looking for any experiences similar like my case or any working receipe to
share.

Thanks!