You can deposit films by UV photopolymerization at very low
temperatures --reported down to -10C back in the mid 70s.

                                        -CHM

On Wed, 9 Sep 1998, lee ki seong wrote:

>
> hello, colleague
> It might be silly question to somebody.
>
> but I think it's impossible.
>
> Is there anybody who try to deposit some film at very low temperature.
>
> In PECVD plasma usually occur a little high temp because mobility of
>    electrons are better as temperature higher.
>
> I think it'll possible ,if there is something to break the eletron orbit
>   from nuclear.
>
> If there is anybody to make a new process , would you join me and
>   make revolution.
>
> with thanks.
>
>