A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: deposition and patterning of thick SiO2
deposition and patterning of thick SiO2
2008-12-14
Andrea Mazzolari
2008-12-16
Glenn Silveira
2008-12-17
Aron Michael
deposition and patterning of thick SiO2
Glenn Silveira
2008-12-16
Andrea,

You can deposit PECVD TEOS 4um thickness. TEOS SiO2 etches much faster than
thermal oxide so your photo resist should hold up fine in 7:1 BOE

Best regards,

Glenn

-----Original Message-----
From: Andrea Mazzolari [mailto:[email protected]]
Sent: Sunday, December 14, 2008 9:35 AM
To: [email protected]
Subject: [mems-talk] deposition and patterning of thick SiO2

Hi all,

i need to deposit and pattern 4um of SiO2 on germanium.
Some questions:
1) is it possible to deposit SiO2 on germanium ?
2) is it possible to achieve so thick layers ?
3) is it possible to pattern so thick layers ?

About point 3: i have the possibility to pattern SiO2 with BOE solutions
and S1813 photoresist, but i'm afraid that the photoresist will not
withstand the so long needed etch time.

Best regards,
Andrea
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMS Technology Review
University Wafer
Nano-Master, Inc.
Process Variations in Microsystems Manufacturing