For what purpose?

To remove O2, to surface treat for wetability O2.

Ed

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of basar bolukbas
Sent: Friday, January 30, 2009 2:45 PM
To: mems litho
Subject: Re: [mems-talk] Double lithography problem with SU1828-TI35ES


Hello Edward.

Which kind of plasma treatments are suitable for SU1828?
Or is it not changeable resist by resist?
I use SU1828 for first lithography and TI35 for second.
I think i will treat SU1828 but i am not sure for the ambient. I can
apply O2 plasma, CHF3, SF6, CCl2 with RIE also.

Which one is suitable do you think?

Thank you for your help.