We usually do our PEB at 120 degrees C for 20-30 min in an oven. If
you use a hot plate I assume that you should use other times.

/Mikael

On 7 feb 2009, at 16.47, Evelyn B wrote:

> I have heard that for improved etch resistance 1813 resist should be
> post-develop baked.  Does any one know the recommended post
> development bake
> temperature and duration for 1813 resist?  I understand that both the
> temperature and duration should be larger than that of the soft-bake.
>
>
> EVELYN BENABE
> Graduate Research Assistant
> RF Microsystems Research Group
> University of South Florida
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