Hy Evelyn,

after development i do an hard bake of 5 min at 115 °C over hot plate. If
you don't have an hot plate you can use an hoven (140 °C for 40 min).
In order to improve etch resistance i also suggest you to use HMDS as
adesion promoter. Basing on my experience i can say that it really helps a
lot.

Best regards,
Andrea

> I have heard that for improved etch resistance 1813 resist should be
> post-develop baked.  Does any one know the recommended post development
> bake
> temperature and duration for 1813 resist?  I understand that both the
> temperature and duration should be larger than that of the soft-bake.