Hi to all,

I want to use sputtered Cr/Au layer as a mask for the anisotropic KOH Si
etching, however I could not find any resources about this subject on
the internet. Can Cr/Au layer be suitable for this kind of process?

--
Ilker Comart
Researcher
M.Sc. Student
MEMS-VLSI Group
Electrical-Electronics Eng. Dept.
Middle East Technical University
Ankara, Turkey

Tel: +90 312 210 2340
Fax: +90 312 210 2304