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MEMSnet Home: MEMS-Talk: Selectivity of etching LTO over sputtered silicon nitride using BHF/BOE
Selectivity of etching LTO over sputtered silicon nitride using BHF/BOE
2009-04-15
Yu Wang
2009-04-16
Robert MacDonald
2009-04-17
Wang, Yu
2009-04-20
Robert MacDonald
2009-05-14
Yu Wang
2009-05-15
Chris P. Park
Selectivity of etching LTO over sputtered silicon nitride using BHF/BOE
Yu Wang
2009-04-15
Hi,

I want to release my LTO (deposited by LPCVD) sacrificial layer uisng
BHF/BOE. Previous posts said that the selectivity is good over LPCVD silicon
nitride, but bad over PECVD silicon nitride. I would like to know its
selectivity over silicon nitride sputterred at room temperature and a rate
of ~1.5nm/min.

Any answer will be appreciated.

Thanks,

Yu Wang

reply
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