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Hi,
Photoresist should be stored in a dark cool place, such as a
refrigerator.
The bottle should not be agitated in such a way as to create bubbles. Any
suspect bottles should be allowed to stand still for a period of several
hours to allow any bubbles to dissipate.
When depositing the photoresist onto a substrate, the substrate should
be
flat, and the photoresist deposited onto the wafer without any 'gaps'. These
will cause film inhomogenieties to be present upon polymerisation.
Iso propyl alcohol or acetone are good solvents. IPA is better for removing
water etc..
Karl H. Cazzini
(Ph.D)
Conifer Group & Associates,
116 Cochituate Road,
Framingham MA 01701
USA
-----Original Message-----
From: [email protected] [mailto:[email protected]]On Behalf Of
Radhakrishna Vatedka
Sent: Tuesday, September 29, 1998 2:39 PM
To: [email protected]
Subject: lithography problems
Hi all,
I am new to lithography technique. I am facing few practical problems.
I will be grateful if some one helps me in this regard.
1. I face problem of bubbles on the photoresist. If i remove bubbles
with difficulty, still i find discontinuity in resist film of microns after
spin coating.
2. how to store photoresist? in refrigerator?
3. Which is the best solvent for photoresist (to wash away after
etching)?
Is it universal one? I used acetone.
The photoresist i am using is a positive one HPR204.
with regards
Radhakrishna.V
_________________________________________
Radhakrishna.V
Research Student
Dept. of Instrumentation | Room No: R47
IISc, Bangalore-560 012 | IISc Hostel
Ph: 309 2349 | Ph: 309 2539
___________________________________________
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ORG:Conifer Group and Associates;
TITLE:Snr. Research & Development Engineer
NOTE:Please note that I have voicemail on my home and business lines.
TEL;WORK;VOICE:(508) 620-8845
TEL;HOME;VOICE:(508) 875-2009
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