Hi all,

I have to perform lift off with thick photoresist AZP4620 acting as a
electroplating mold.

I would be interested to know about the processing conditions (exposure
dose, development time) for AZP4620.

I have done it several times previously but did not work out for me since
the patterns were ridiculous(especially the 10 um patterns)  once they were
developed.

I also referred to the datasheet of AZP4620 but could hardly understand
about the process conditions in there.

Any suggestions will be highly appreciated.

Thanks!

Anirban
Electrical Engineering
Louisiana State University
Baton Rouge
70802,USA