It seems as though the wafer is not cooled enough. Check the He cool. 11u
resist should last you ~300u silicon.

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Taekyung Kim
Sent: Monday, July 20, 2009 7:20 PM
To: [email protected]
Subject: [mems-talk] Si Deep RIE with AZ9260 mask

Hello folks,

I'm trying to do Si deep RIE with AZ9260 photoresist as a mask in a
PlasmaTherm etcher.
Any good recipe for AZ9260 PR?

The recipe I used was as follows.

1. AZ9260 spun at 2000 rpm for 60s (~11um)
2. 110C 5 min softbake
3. 540mJ/cm2 exposure
4. AZ 421K developer ~3min
5. No hardbake.

The smallest feature size is 20 un wide lines.

The mask would barely hold up to 200 cycles of etching.

Thanks

TK