A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: overexposed resist removal
overexposed resist removal
2009-07-28
[email protected]
overexposed resist removal
[email protected]
2009-07-28
Dear all,

Does anybody know how to remove overexposed ZEP520 and/or PMMA?
I tried with acetone and pyrrolidinone at 25ÂșC, but it is not enough to
remove them. My structures are made just of silicon and silicon dioxide.

Should I try a oxigen plasma at low power?

Any suggestion would be greatly appreciated!

Regards,

Jose
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Addison Engineering
MEMS Technology Review
MEMStaff Inc.
Nano-Master, Inc.