I am having adhesion problems of photoresist on LiNbO3 substrate. I've tried
HMDS (vapor prime) but it is not clear to me if HMDS works on LiNbO3.
Furthermore, my problem is exacerbated by the fact that I am not doing any
soft-bake or PEB, in order to avoid charge build-up on the substrate.
Instead I've been drying the resist films in a vacuum at room temperature.
This is Shipley 955 resist. Any thoughts would be appreciated.
Thanks.