still LPCVD will be able to do the trick.  you probably can try to an annealing
process after the deposition process.  that can help.  but how thick should the
nitride be? it depends what thickness of nitride you are looking for, for your
beams.

just a little help for you to consider.

regards,
Nimo

--- On Mon, 8/17/09, Roger Shile  wrote:

From: Roger Shile 
Subject: [mems-talk] Source for Low Stress Silicon Nitride
To: "General MEMS discussion" 
Date: Monday, August 17, 2009, 9:32 AM

Can someone suggest a commercial for low stress silicon nitride with low
stress gradient?

Low stress gradient is important as the films will be used to fabricate
free standing beams which must remain straight when released.

Roger Shile