Dear all,
we created patterns on SiO2 with Cr and Au(etching process). Then, PMMA
was spin coated on the chip followed by EBeam lithography to create a
few windows on PMMA. We etched part of SiO2 in diluted HF(5:50ml) for
5mins. After removing PMMA in acetone, we found all fine gold
structures peeled off even under areas protected by PMMA.
Could I have some suggestions to solve it please?
Thanks,
Hao