he must try all.  KOH is also a good option for sure.  KOH, DRIE or
HF+HNO3+wafer...the one which works best.

--- On Mon, 8/17/09, Xiaoguang Liu  wrote:

From: Xiaoguang Liu 
Subject: Re: [mems-talk] KOH etch
To: "General MEMS discussion" 
Date: Monday, August 17, 2009, 3:43 PM

I don't think DRIE will give the same smoothness as an KOH etch.

For renil's purpose, I think any concentration between 15%-50% will
work, because <111> surface is usually quite smooth over a wide range
of KOH concentrations.

Best
Leo