Hi Bob,

Could you please elaborate more on how you achieved successful pattern
transfer without using a post exposure bake? The post expsure bake is
required to cross-link exposed areas of the SU8. If you omit this step
then surely at the development stage your SU8 will simply wash off? If
you have found some way of using  SU8 as a  hard mask without the need
for a  post exposure bake then that would be something....

Best regards

James Grant

Bob Henderson wrote:
> We just eliminated the second bake. Bob Henderson
>
> -----Original Message-----
> From: [email protected] [mailto:[email protected]]
> On Behalf Of Yu Wang
> Sent: Tuesday, September 08, 2009 10:51 AM
> To: General MEMS discussion
> Subject: Re: [mems-talk] SU8
>
> Hi, Ken,
>
> I'm very interested in your process. Would you please tell me how you
> avoided cross-linking (from softbaking to DRIE)?

--
Dr. James Paul Grant
Postdoctoral Research Associate
Microsystems Technology Group
76 Oakfield Avenue Room 3
University of Glasgow
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