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MEMSnet Home: MEMS-Talk: Bilayer photoresist process
Bilayer photoresist process
2009-10-01
Andrea Lucibello
2009-10-02
Jie Zou
2009-10-02
Andrew Sarangan
2009-10-02
Daniel Lloyd
2009-10-03
Andrea Lucibello
2009-10-03
Andrew Sarangan
2009-10-04
Jie Zou
2009-10-04
Andrea Lucibello
2009-10-05
Daniel Lloyd
2009-10-05
Andrew Sarangan
Bilayer photoresist process
Andrew Sarangan
2009-10-05
The spikes on the resist profile after the reflow bake is curious. I
am not sure of the cause. Was this a hotplate or oven bake? The
temperature profiles will be different in each case so it might be
worth trying both.



On Mon, Oct 5, 2009 at 12:55 PM, Daniel Lloyd  wrote:
> Hi Andrea,
>
> Based on what the usual results are from reflowing I'm afraid I can't help you
with what the profile is doing- it is rather unexpected though. I believe you
should be able to achieve your shape- you may need careful temperature/time
control to avoid getting a fully domed effect. As for the actual shape of the
profile, how are you measuring it? Those spikes look very reminiscent of some
ghost effects caused by use of SWLI type instruments which can also suffer when
measuring semi transparent resists like the S1818- they're much more trouble at
slightly thinner thicknesses though. If you can try measuring it with a laser
interferometer or on an AFM/in an E-beam system you might see a very different
shape.
>
> Regards,
>
> Daniel
reply
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