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MEMSnet Home: MEMS-Talk: wet etch of 2um Si3N4
wet etch of 2um Si3N4
2009-10-30
Nor Hafizah Ngajikin
2009-10-30
Kuijpers, Peter
2009-10-30
Shivalik Bakshi
2009-10-31
Edward Sebesta
2009-10-31
xudehui0108
wet etch of 2um Si3N4
Shivalik Bakshi
2009-10-30
Hi Hafizah,

Hot H3PO4 works on stoichiometric Nitride. Not on silicon-rich low-stress
nitride.
If you have 2um of Nitride, i suppose it is of the latter type?

Shivalik


> From: [email protected]
> To: [email protected]
> Date: Fri, 30 Oct 2009 15:42:32 +0100
> Subject: Re: [mems-talk] wet etch of 2um Si3N4
>
> Hello Hafizah,
>
> In here we also use hot H3PO4 (160°C).
> Etchrate on LPCVD SiN is app. 3nm/min
> Another method we use is etching in HF[48%], etchrate is also app. 4nm/min
>
> Regards,
>
> Peter Kuijpers
reply
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