Hi,
    I am trying to deposit metal on SiN membrane windows after lithography and
want to perform liftoff. But seems it is very hard to remove resist enen
overnight soaking in PG remover. Since membrane is only around 50 nm thick, and
I can't not use ultrasonic bath because it will break membrane.  I even have
trouble in using N2 blow to dry membrane wafers. Does anyone have any experience
how to do it on membrane?

Thanks

Xiaoyong