protecting layer/material during KOH SiN membrane formation
Xiaoyong Liu
2010-01-07
Hi All,
I am in a processing of making SiN membrane by using KOH chemical etching
on SiN(~50nm) coated Si wafers. There are some patterns on one side of wafer,
and I want them intact during KOH etching. The total etching time will be about
5-6 hours. I am wondering if there is any material/film I can put on to protect
that side of wafer, and can be readily removed afterwards.
Thanks a lot
Xiaoyong
[email protected]