What makes you think your 2nd method is not working? I've used a similar
method which works fine. I never use a ultrasonic with the solvent strip as
it is what rips off the structures.

Robert


-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Jiho Song
Sent: Monday, January 25, 2010 9:57 PM
To: General MEMS discussion
Subject: [mems-talk] PR stripping

Hello all,

I'm having some problems with PR stripping off from the Si chip.
Because I have a small structure that when I put in ultrasonic bath with
acetone, an entire device lifted off.

Thus, I have changed to O2 plasma for 5min (1 Torr and 200 W) and acetone
bath for 10 min. But I am not sure it strips off PR clearly.

Does anyone have any ideas?