Hello Mike,
You may try to dilute standard positive resist with its solvent (e.g. AZ
1505 with PGMEA (AZ EBR Solvent)) to achieve such low thickness. I am not
sure how good the film quality and coverage is but you may try it.
Best regards,
Daniel Figura
smartfabgroup
process consulting - data processing - fab software
Phone: +44 20 3286 4342
E-mail: [email protected], Web: www.smartfabgroup.com
-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Michael Cooke
Sent: Monday, February 08, 2010 5:37 PM
To: [email protected]
Subject: [mems-talk] 50 nm resist
Hi
does any one know of a 50nm positive resist (for use in a standard UV
mask aligner) ?
Thanks
Mike
