Dear Mike,

 I agree with Daniel, but you should consider that all factors like e.g.,
time and power of exposure, time of the soft-baking etc. during its
treatment must be suited by yourself. The data sheet from the manufacturer
might be not helpful.

Good luck!

 Karolina

---------- Wiadomość przekazana dalej ----------
From: "Daniel Figura" 
To: , "'General MEMS discussion'" <
[email protected]>
Date: Tue, 9 Feb 2010 21:24:59 +0100
Subject: Re: [mems-talk] 50 nm resist
Hello Mike,

You may try to dilute standard positive resist with its solvent (e.g. AZ
1505 with PGMEA (AZ EBR Solvent)) to achieve such low thickness. I am not
sure how good the film quality and coverage is but you may try it.

Best regards,

Daniel Figura