Hi,

you can use the positive photoresist AZ4562 (or the SPR220), his prebake
temperature is around 105°C (115) and it is very strong in RIE process,

best,

Alaa

limengyue26 a écrit :
> dear all,
>
> We are using your Microchem's product - PMMA, the Positive EB resist. But
during our microfabrication process, the tempature is not allowed to be higher
than 100°C. But the prebaking tempature of PMMA is always 180°C, or ranging from
140°C to 200°C in the data sheet.
>
> The second problem of PMMA is it can not bear severe RIE(reactive ion ething).
>
> Do you have some suggestion about some resist which property is similar to
PMMA but can be prebaked at lower tempature, 120°C at most, and of course not
higher than 100°C is better. At the same time, it also can have a better
performance when RIEed.
>
> Thank you !
>
> limengyue

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Alaa el dine ALLOUCH
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