Hi gary,
You can use simple RIE etching by O2 plasma. But this will remove all the PR, it
is not selective to negative photoresist.
Recipe: O2: 50 sccm, Temp: 25C, Power: 200W. Good luck
Muhammad Qazi
Dept of EE
University of South Carolina
Columbia, SC29208
-----Original Message-----
From: Tingjie Li [mailto:[email protected]]
Sent: Thursday, June 17, 2010 11:28 AM
To: [email protected]
Subject: [mems-talk] isotopic etching of negative photoresist
Hi All,
Does anyone know how to carry out isotopic etching on negative photoresist?
Thank you so much!
--
Best Regards/
Gary Li
The University Of Western Ontario
1151 Richmond Street
London, Ontario,Canada
N6A 5B9
