Hi,
   I am in the process of fabrication of some patterning  on SiN membrane
window. It involves of lithography, film deposition and liftoff. Since membrane
is so fragile(the thickness is about less or around 100nm), it is very easy to
break during lift off/ cleaning process which may require sonication, some times
even N2 blow dry may damage membrane window.  I am wondering if anyone have
experience of how to handle it and share it with me.

Thanks

Xiaoyong