Hi Darren,

indeed, your lithography looks ...hm... not good. I'll guess, no lift-off
possible.

Something is really wrong with your litho. It could be: mask not in contact
with substrate or wrong focus. Too low dosis (looking at 10um line). Old or
contaminated resist/developer. Wrong processing order? Try to check this
first with other users. 10um lines should be very easy to pattern.

Furthermore, what is you substrate? Could it be that your (alkaline)
developer attacked the substrate?

Best
Daniel

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of
Darren Alvares
Sent: Montag, 16. August 2010 02:12
To: [email protected]
Subject: [mems-talk] Lift Off

Hi All,

I am using a photoplotted transparency mask to pattern resist for a lift off
process. I have a series of lines I have exposed. See image:
http://yfrog.com/mhimage31np

Looking at the pattern under the microscope indicates that there is no sharp
edge on the corner. I have used AZ6632 positive resist. To me this doesn't
look like it will be successful with lift off.

This lines are smallest to largest 10,20,30..um.

Any suggestions or thoughts on:

-Whether lift off will occur.
-What could be the problem. Resist, Exposure Time, Baking, Proper Contact
with substrate?

Looking forward to hearing from you regarding this.

Cheers,
Darren