Antonella:

I am assuming you are trying to spin coat SU-8 resist on the Si/SiO2
substrate. I would suggest you first spin coat HMDS (monolayer) and than
spin coat SU-8 on top of HMDS. Here HMDS helps in excellent adhesion. I have
used HMDS with other resists and it works great. If you have any other
specific questions feel free to contact me. Thank you.

Regards
Jayant
**********************************************************
Jayant Neogi
Director: Research and Development
NORSAM Technologies

Ph#  (503) 640-0586
Fax# (503) 640-8117
************************************************************
-----Original Message-----
From: Antonella Benvenuto 
To: [email protected] 
Date: Thursday, October 29, 1998 11:29 AM
Subject: About SU-8


>
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>Dear MEMS researchers,
>I'm now using EPON SU-8, but I have a problem to make a good adhesion
>between the Si wafer (1 micron SiO2 layer on) and the SU-8.
>Please does anyone tell me processing guide lines about?
>Thank you very much,
>Antonella
>
>
>-----------------------------------
>Antonella Benvenuto
>Electronic Eng.
>Mitech Lab-Scuola Superiore Sant'Anna
>Via Carducci 40
>56127 Pisa- Italy
>Tel +39 050 883403
>Fax +39 050 883402
>e-mail: [email protected]
>-----------------------------------
>
>
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>
>Dear MEMS researchers,
>
I'm now using EPON SU-8, but I have a problem to make a good adhesion
>between the Si wafer (1 micron SiO2 layer on) and the SU-8.
>
Please does anyone tell me processing guide lines about?
>
Thank you very much,
>
Antonella
>
 
>
>
-----------------------------------
>
Antonella Benvenuto
>
Electronic Eng.
>
Mitech Lab-Scuola Superiore Sant'Anna
>
Via Carducci 40
>
56127 Pisa- Italy
>
Tel +39 050 883403
>
Fax +39 050 883402
>
e-mail: [email protected]
>
-----------------------------------
>
 
>
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>