Hi all;

Now i am making silicon rib waveguide using dry etcing . To decrease the
sidewall roughness as much as possible i plan to use Room T continuous process
instead of Bosch process. Anybody can give some suggstion to increase the etch
rate ?

My  process parameter:SF6:C4F8:O2

sccm:5sccm:80sccm,power=800w,time=120s,pressure=10mT,RF power=10w


Andrew
Phone：13764619431