Dear All,

I am trying to grow MIM (Metal - Insulator - Metal) structure by first
depositing plasma polymer dielectric coating of approx. 0.5 micrometer on Al
substrate and then by depositing Al layer on top of it by magnetron sputtering.

After PECVD process, substrate shows good insulating layer but after PVD of Al,
instead of showing insulation between top and bottom conducting contact, it
shows continuity.
Can any one suggest me what is the best method to coat Al on top of dielectric
to form a M-I-M capacitor across which C-V characteristics can be measured ?

Thanks & Regards;

Ms. Purvi Kikani Dave