thank you Andrew,  I also think the sputtering Cr film should have lots of
problem. But the Sputtering is the only way to deposit Cr in our lab.  i
think what if i  change the recipe of the sputtering, the film could become
more dense.


On Tue, Dec 14, 2010 at 12:04 AM, Andrew Sarangan wrote:

> Most likely Cr has pin holes in the film and the HF is penetrating
> through it. Sputtered Cr is particularly prone to developing pin
> holes. I've had better luck with evaporated Cr.

--
Yan Xin
-Pen-Tung Sah MEMS Research Center,
-Xiamen University, CHINA
XMU HOME:
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