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MEMSnet Home: MEMS-Talk: RF-DC sputtering _ need some suggestion(s)
RF-DC sputtering _ need some suggestion(s)
2011-01-26
Yassine AEA
2011-01-26
Ruiz, Marcos Daniel (SENCOE)
2011-01-26
Yassine AEA
2011-01-26
Ruiz, Marcos Daniel (SENCOE)
2011-01-27
Brian Stahl
2011-01-28
Yassine AEA
2011-01-28
Ruiz, Marcos Daniel (SENCOE)
2011-01-26
Gary Hillman
2011-01-26
Shay
2011-01-26
Wilson, Thomas
2011-01-28
Yassine AEA
2011-01-28
Kagan Topalli
2011-01-28
Yassine AEA
2011-01-31
Yassine AEA
RF-DC sputtering _ need some suggestion(s)
Yassine AEA
2011-01-26
Cr-doped IO samples have been grown in-house on p-Si(100) by using
RF-DC sputtering deposition method. The RF is used for IO target
(125-250w) and DC for Cr-target ( 7-15W). The argon flow is kept at
24 mTorr.

Recently, SEM-analysis shows the samples are oxygen rich (80 %), we
have been advised to buy a new target and to use a heater to keep the
substrate at certain temperature in one side and in the other side to
descend the percentage of oxygen. Yet, we are still getting a very
high atomic percentage of oxygen.

Any suggestion, idea will be great.

thanks,
Yassine,Ait El Aoud
UML,MA
reply
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