Has anyone pursued a method as a replacement for RIE in nano-imprint
lithography for the descum step? NIL could be a lot more useful if the
descum didn't require expensive equipment too.

I am curious if dielectric barrier discharge, or some sort of atmospheric
plasma could be used for this step, it would open up a wide variety of
options in terms of substrate size, and could reduce the cost of performing
that step. I'd be interested in pursuing it, if anyone has any ideas.

Sincerely,
David Casale