Dear All,

I want to make a air bridge fabrication, but i have some problems.

When i spin-coat second resist layer on top of first one, my first layer is
dissolving due to second resist's resolvent i guess.  I couldn't solve this
problem even i tried different a lot of things.  So i couldn't make double photo
lithography.

Could you suggest some details to me?

I will be appreciate for your great support.

Thank you very much.
Best Regards.