Hi,

You may use other way such as thermal evaporation or ebeam evaporation.
Sputtering deposition will cover the side wall of pattern, which is not good
for lift-off.

Regards

Weiquan


2011/5/23 崔林 

> Hi,
>
>     I am using the e-beam to pattern my sample,
> the resulotion is not very high, just around 500nm, and my
> sample is 10nm aluminum on sapphire.
>
>    It is followed by sputtering 100nm metal aluminum.
>    After that, I use the aceton to do the lift-off.
>
>    My problem is that the metal did not peel off as expected. I
> appreciate any advice.
>
>    Thank you!