Buffered Oxide Etch is available in several concentrations (we use 50:1,
10:1, 6:1 BOE)

Dan Ruiz

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf
Of Ned Flanders
Sent: Tuesday, June 07, 2011 11:14 PM
To: General MEMS discussion
Subject: [mems-talk] Controlled, slow and smooth glass etching

Hi all,

I need to etch 100 nm of borosilicate glass. I used a diluted HF + HCl
recepy - but it seems that when diluted, this doesn't create a very
smooth etch surface. However, I cannot use it in a more concentrated
form, as it has an etch rate of about 8 um/min and I need to control
the etch depth with a higher degree of precision. I need 100 nm +/- 20
nm

Any suggestions?

thanks

m