Hi Gary,

Because I would like to etch 300nm in Silicon to do a Master. I did a E-Beam
lithography in PMMA but PMMA is a bad kind of material in RIE to etch great
depths in the silicon. Then we use a thin layer of SiO2 to the brokering of
silicon etching.

Judith

2011/6/6 Gary Hillman 

> Judith why so thin a layer of oxide.  Gary
>
> Gary Hillman