Thanks Nichols,


this sounds very interesting. I think we'll try this. Just so I make
sure I understand: you use these millimolar solutions and mix them in
equal proportions?

Also, how detrimental is this solution to a standard positive
photoresist such as AZ1505 (for example)?


Thanks again!


m

On Wed, Jun 8, 2011 at 4:07 PM, Kevin Nichols
 wrote:
> 50:25:37.5 mmol/L HF/NH4F/HNO3 at 25C gives a smooth ~13 nm / minute
> in the borosilicate I use.
>