Dear Dr. Johnson,

concerning your e-mail you send around on May, 20th, where you asking
for other options for grayscale lithography than Canyon Materials'HEBS,
I can answere with YES.

At ISIT we improve and apply graytone lithography utilizing an
inexpensive one-step lithographic method using a raster-screend
(graytone) quartz-Cr reticle, with subresolution pixel elements. This
typ of mask you can get at any commercial mask shop and you are able to
mix graytone structures with digital once. Graytone specific is only the
design of the subresolution pixel arrays. For this we developed a
software tool called GRADED which we use in house. This tool takes
account of all nonlinear process characteristics which happens during
the graytone exposure like e.g. resist contrast. In addition we have a
resist process available allowing thicknesses up to 20 um. Combining
these two technologies we are able to fabricate fluid jets, shaped
electrodes for electrostatic drives, shaped mirrors, shaped gratings,
refractive and diffractive optical elements. We also transfere this
structures in silicon e.g. for IR-applications or make replicas of these
structures in Polycarbonat together with an industrial partner.

For more detailed information there are some publications available:
- Proc. SPIE Vol. 3008, p. 279-299, San Jose 1997
- Proc. SPIE Vol. 3226, p. 6, Austin, 1997
- Proc. of Int. Conf. on Optic & Electronics at IRDE, India, 9-12 Dec,
1998

or look at our web-side:
http://www.isit.fhg.de/english/mst/DOE.html
http://www.isit.fhg.de/english/mst/graytone.html

I you have some more questions, please do not hesitate to phone or
e-mail me.

Kind Regards

  Klaus Reimer

_____________________________________
Dr. Klaus Reimer
Fraunhofer-Institut für Siliziumtechnologie
Fraunhoferstrasse 1
D-25524 Itzehoe
Germany
Tel.:   +49 4821 174506
FAX     +49 4821 174251
e-Mail  [email protected]
Internet        http://www.isit.fhg.de
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