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MEMSnet Home: MEMS-Talk: Ti etching and S1813 resist
Ti etching and S1813 resist
2011-07-12
Shane GUO
2011-07-12
Kirt Williams
2011-07-12
Michael Martin
2011-07-12
Shane GUO
2011-07-12
G. Puebla-Hellmann
2011-07-13
David Springer
2011-07-17
Yunda Wang
2011-07-14
Shane GUO
Ti etching and S1813 resist
Shane GUO
2011-07-12
Sorry guys, I should clarify this. My situation is that I can only use wet
etching. We do not have DRIE equipment. Our O2 plasma may not be powerful enough
for dry etching. It is only used for cleaning wafers.

Cheers

>________________________________
>From: Shane GUO 
>To: "[email protected]" 
>Sent: Tuesday, July 12, 2011 11:57:08 AM
>Subject: Regarding Ti etching and S1813 resist
>
>
>Hi all,
>
>
>I would like to use S1813 resist as an etching mask for Ti. I am wondering if
there is anything that does not contain HF can work for me? I am thinking about
oxalic acid or H2O2. Do they attack S1813 resist? Can they work for a 100nm Ti
layer? Any suggestion is welcome.
>
>Best regards
>
reply
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