Hello All,

   I have deposited a SiO2 film about 100nm on n-GaN as insulation by
E-beam evaporator. but the quality is not so good, such as surface break
when dipped in Actone solvent for hrs. And I want to apply the rapid
thermal annealing on SiO2/GaN. Can anyone give some details about the
annealing recipe for SiO2?


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Sincerely
Jack, Zetao MA
Dept.of EEE, CYC712,HKU