If your sample/ process permits, do a O2 plasma cleaning ... 75Watt, 1 min,
20 sccm O2 should clean things up

Fahad

On Mon, Nov 7, 2011 at 8:49 AM, Judith Linacero Blanco
wrote:

> Hello everyone,
>
> I made a lithography by e-beam with lines of 200nm separated 200nm with
> 300nm of PMMA on silicon.
>
> Once I etch the silicon with RIE, and then I try to clean the
> sampleacetone,
> sonicated. The problem is that I still have traces of PMMA in the sample,
> and I can't clean at all the sample.
>
> Can anyone help? How I can clean the whole sample of e-beam lithography?