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MEMSnet Home: MEMS-Talk: cleaning e-beam litography sample
cleaning e-beam litography sample
2011-11-07
Judith Linacero Blanco
2011-11-07
Jack
2011-11-07
Sk Fahad Chowdhury
2011-11-07
G. Puebla-Hellmann
2011-11-08
Jorge Ramiro
2011-11-09
Judith Linacero Blanco
2011-11-10
Judith Linacero Blanco
2011-11-07
Matthieu Nannini, Dr.
2011-11-07
Alexander Slesarev
cleaning e-beam litography sample
Judith Linacero Blanco
2011-11-09
What is RCA cleaning?

Today I proved during 1 hour with NMP sonicate, but I have something in my
sample!

Tomorrow I'll try with NMP at 80ÂșC. If my sample is not cleaned, then I use
RIE with O2, but I'm afraid if this process would modify my sample.

Best regards,

2011/11/8 Jorge Ramiro 

> Hi Judith,
>
> Have you tried a RCA cleaning? The first step, SC1, removes organic
> contaminants.
> Other options are using a "piranha" etch or an oxygen plasma.
> Best regards,
>
> Jorge Ramiro
>
reply
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