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MEMSnet Home: MEMS-Talk: cleaning e-beam litography sample
cleaning e-beam litography sample
2011-11-07
Judith Linacero Blanco
2011-11-07
Jack
2011-11-07
Sk Fahad Chowdhury
2011-11-07
G. Puebla-Hellmann
2011-11-08
Jorge Ramiro
2011-11-09
Judith Linacero Blanco
2011-11-10
Judith Linacero Blanco
2011-11-07
Matthieu Nannini, Dr.
2011-11-07
Alexander Slesarev
cleaning e-beam litography sample
Judith Linacero Blanco
2011-11-10
Hi et. al,

I've cleaned my sample with RIE (20sccmO2+75W+80mT) and finally my sample is
very clean!

Thanks a lot.

One more question, Is it possible that this process will damage my sample?


2011/11/9 Judith Linacero Blanco 

> What is RCA cleaning?
> Today I proved during 1 hour with NMP sonicate, but I have something in my
> sample!!
> Tomorrow I'll try with NMP at 80ÂșC. If my sample is not cleaned, then I
> use RIE with O2, but I'm afraid if this process can modificated my sample!
> Best regards,
>
> 2011/11/8 Jorge Ramiro 
>
>> Hi Judith,
>>
>> Have you tried a RCA cleaning? The first step, SC1, removes organic
>> contaminants.
>> Other options are using a "piranha" etch or an oxygen plasma.
>> Best regards,
>>
>> Jorge Ramiro
reply
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